Continuous Oxygen Monitor Detects Leaks in Semiconductor Transfer Chambers

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Continuous Oxygen Monitor Detects Leaks in Semiconductor Transfer Chambers

An extremely low-maintenance oxygen (O2) monitor designed to continuously monitor semiconductor process tool transfer stations and a load locks for leaks is available from PureAire Monitoring Systems. Suitable for use in vacuums as low as 10-3 torr, the PureAire Air Check O2 Monitor is unaffected by fluctuations in pressure, temperature, or humidity. The instrument displays oxygen concentrations on a local digital display and outputs a corresponding analog signal.

The heart of the PureAire Air Check O2 Monitor is a long-lasting zirconium type sensor, which responds to low oxygen conditions within 5 seconds and provides accurate measurements even in areas subjected to high electro-magnetic fields. The sensor boasts a 5+ year operational life and requires absolutely no maintenance. The system’s operating temperature and humidity ranges are -40° to 122°F (-40° to 50°C) and 0 to 99% RH, respectively.

The Air Check O2 monitor may be linked to any distributed control system or programmable logic controller. It operates on 24 VDC power, measures 5.5 (W) x 10.5 (H) x 3.25 (D) inches (140 x 267 x 83 mm), and is housed in a NEMA 4X enclosure. Optional user-adjustable alarm relays are available.

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